Titanium Sputtering Targets (Ti)

 

Attributes Name

Pure Metal Targets

Product Name

Titanium Sputtering Target

Element Symbol

Ti

Purity

3N, 4N, 4N5, 5N

Shape

Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made

 

Applications
 Decorative coating 
• Hardware tool coating
• Semiconductor
• Flat panel displays

Features
• Competitive pricing
• High purity
• Grain refined, engineered microstructure
(Average grain size < 20 um)
• Semiconductor grade

Manufacturing Process
 Melting (EB-Electron Beam Melting)
• Analysis
• Casting & Grain refinement
  Forging, Rolling, Annealing, Micrography, Machining
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment

Options
• 99.5% minimum purity
• Semiconductor grade titanium alloys available
  Ti/Al, W/Ti 90/10 wt%)
• Smaller sizes also available for R&D applications
• Sputtering target bonding service

 

 

We provides specialty metal(especially titanium) thin film PVD materials in a wide variety of sputtering target configurations according to client's requirements.

 

 

 

 Xi'an Ocean Trading Co., Ltd.Xi'an Ocean Trading Co., Ltd.

 

 

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